Invention Grant
- Patent Title: Semiconductor device and method for manufacturing same, for releaved stress and high heat conductivity
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Application No.: US16088532Application Date: 2016-10-31
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Publication No.: US10707146B2Publication Date: 2020-07-07
- Inventor: Motoru Yoshida , Yoshiyuki Suehiro , Kazuyuki Sugahara , Yosuke Nakanishi , Yoshinori Yokoyama , Shinnosuke Soda , Komei Hayashi
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Xsensus LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@69c225c6
- International Application: PCT/JP2016/082199 WO 20161031
- International Announcement: WO2017/183222 WO 20171026
- Main IPC: H01L23/40
- IPC: H01L23/40 ; H01L25/18 ; H01L21/52 ; H01L25/07 ; H01L21/56 ; H01L23/373

Abstract:
Provided is a semiconductor device having high heat conductivity and high productivity. A semiconductor device includes an insulating substrate, a semiconductor element, a die-bond material, a joining material, and a cooler. The insulating substrate has an insulating ceramic, a first conductive plates disposed on one surface of the insulating ceramic, and a second conductive plate disposed on another surface of the insulating ceramic. The semiconductor element is disposed on the first conductive plate through the die-bond material. The die-bond material contains sintered metal. The semiconductor element has a bending strength degree of 700 MPa or more, and has a thickness of 0.05 mm or more and 0.1 mm or less. The cooler is joined to the second conductive plate through the joining material.
Public/Granted literature
- US20190122955A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2019-04-25
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