Invention Grant
- Patent Title: High-purity dispense unit
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Application No.: US15675376Application Date: 2017-08-11
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Publication No.: US10712663B2Publication Date: 2020-07-14
- Inventor: Anton J. deVilliers , Ronald Nasman , David Travis , James Grootegoed , Norman A. Jacobson, Jr.
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G03F7/16
- IPC: G03F7/16 ; B05B9/04 ; B05B9/047 ; B05C11/10 ; H01L21/027 ; H01L21/66 ; G03F7/30 ; B05B9/08

Abstract:
Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A modular hydraulic unit houses the elongate bladder and hydraulic fluid in contact with an exterior surface of the bladder. When pressurized process fluid is in the elongate bladder, hydraulic controls can selectively reduce pressure on the bladder to cause expansion, and then selectively increase hydraulic pressure to assist with a dispense action.
Public/Granted literature
- US20180046082A1 High-Purity Dispense Unit Public/Granted day:2018-02-15
Information query
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