Invention Grant
- Patent Title: Apparatus and method for treating substrate
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Application No.: US15681347Application Date: 2017-08-19
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Publication No.: US10714352B2Publication Date: 2020-07-14
- Inventor: Min Jung Park , Jung Yul Lee , Hyun Hee Lee , Soo Hyun Cho
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-Do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-Do
- Agency: Li & Cai Intellectual Property (USA) Office
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@78504869
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/027 ; H01L21/67 ; H01L21/687 ; F26B5/04 ; H01L21/02 ; H01L21/311 ; H01L21/683 ; H01L21/60 ; H01L21/306
Abstract:
Disclosed are an apparatus and a method for treating a substrate. The method includes repeatedly rotating the substrate alternately at a first speed and at a second speed while the treatment liquid is supplied, and the second speed is higher than the first speed.
Public/Granted literature
- US20180061649A1 APPARATUS AND METHOD FOR TREATING SUBSTRATE Public/Granted day:2018-03-01
Information query
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