Invention Grant
- Patent Title: Planarization method
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Application No.: US16244867Application Date: 2019-01-10
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Publication No.: US10714353B2Publication Date: 2020-07-14
- Inventor: Kazuya Hirata
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6b0b0113
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/304 ; B23K26/70 ; B23K26/0622 ; B23K26/08 ; B24B7/22 ; B23K26/53 ; B23K26/00 ; B24B27/00 ; B24B37/20 ; C30B29/36 ; H01L21/02 ; H01L21/66 ; B23K101/40 ; B23K103/00 ; H01L21/04

Abstract:
A planarization method includes a grinding step of holding the opposite side to a separation surface in an SiC ingot by a rotatable chuck table and rotating a grinding wheel having plural grinding abrasives disposed in a ring manner to grind the separation surface of the SiC ingot held by the chuck table, and a flatness detection step of irradiating the separation surface of the SiC ingot exposed from the grinding wheel with light and detecting reflected light to detect the degree of flatness. The grinding step is ended when that the separation surface of the SiC ingot has become flat is detected in the flatness detection step.
Public/Granted literature
- US20190221436A1 PLANARIZATION METHOD Public/Granted day:2019-07-18
Information query
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