Invention Grant
- Patent Title: Mounting table and plasma processing apparatus
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Application No.: US14191953Application Date: 2014-02-27
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Publication No.: US10714370B2Publication Date: 2020-07-14
- Inventor: Taketoshi Tomioka , Taku Gohira , Toshiyuki Makabe
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1c32802b com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@75a8d219
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67 ; H01L21/687

Abstract:
A mounting table includes a base and an electrostatic chuck provided on the base. The base has first and second top surface on which the electrostatic chuck and a focus ring are respectively provided. The second top surface is provided below the first top surface. A coolant path in the base has central and peripheral paths extending below the first and second top surfaces, respectively. The peripheral path has a portion extending along a side surface toward the first top surface. The mounting surface has central and peripheral regions. The mounting surface has protrusions formed in a dot shape. The protrusions are formed such that a contact area between the protrusions of the peripheral region and the backside of an object per unit area becomes greater than a contact area between the protrusions of the central region and the backside of the object per unit area.
Public/Granted literature
- US20140238609A1 MOUNTING TABLE AND PLASMA PROCESSING APPARATUS Public/Granted day:2014-08-28
Information query
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