Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15779617Application Date: 2016-01-29
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Publication No.: US10714404B2Publication Date: 2020-07-14
- Inventor: Ryoji Murai , Mitsunori Aiko , Takaaki Shirasawa
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- International Application: PCT/JP2016/052595 WO 20160129
- International Announcement: WO2017/130370 WO 20170803
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L23/36 ; H01L23/50 ; H01L23/473 ; H01L23/495

Abstract:
A technique disclosed in the Description relates to a technique for improving the heat dissipation capability of a semiconductor element and the heat dissipation capability of a lead electrode without increasing the size of a product. A semiconductor device of the technique includes the following: a semiconductor element; a lead electrode having a lower surface connected to an upper surface of the semiconductor element at one end of the lead electrode, the lead electrode being an external terminal; a cooling mechanism disposed on a lower surface side of the semiconductor element; and a heat dissipation mechanism provided to be thermally joined between the lower surface of the lead electrode and the cooling mechanism, the lower surface being more adjacent to an other-end side of the lead electrode than the one end, the heat dissipation mechanism including at least one insulating layer.
Public/Granted literature
- US20180350713A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-12-06
Information query
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