Invention Grant
- Patent Title: Array substrate and manufacturing method thereof, liquid crystal display device and manufacturing method thereof
-
Application No.: US15951340Application Date: 2018-04-12
-
Publication No.: US10714513B2Publication Date: 2020-07-14
- Inventor: Maomao Fang , Youngjin Song , Ziheng Yang , Shifei Shen , Dengtao Li , Shengrong Li , Yishen Wang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Anhui
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Anhui
- Agency: Calfee, Halter & Griswold LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1ba20df5
- Main IPC: G02F1/1333
- IPC: G02F1/1333 ; H01L27/12 ; G02F1/1362 ; G02F1/1368 ; G02F1/1337

Abstract:
An array substrate and a manufacturing method thereof are disclosed. The manufacturing method includes forming, on a substrate, a first metal pattern layer, a first insulating layer, a second metal pattern layer, and a second insulating layer, successively; coating a photoresist on the second insulating layer; forming a photoresist pattern and an etching protection layer, in a first region of the array substrate, the photoresist pattern exposing a part of the top surface of the second insulating layer, and being coupled to the second insulating layer through the etching protection layer; and performing etching in the first region by using the photoresist pattern as a mask to remove the etching protection layer and at least part of the second insulating layer, without etching the first insulating layer, so as to expose a part of the second metal pattern layer and form a liquid crystal diversion groove.
Public/Granted literature
Information query
IPC分类: