Invention Grant
- Patent Title: Gas liquefaction apparatus and gas liquefaction method
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Application No.: US15542223Application Date: 2016-01-04
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Publication No.: US10718564B2Publication Date: 2020-07-21
- Inventor: Wataru Matsubara , Atsuhiro Yukumoto , Nobuyuki Nishioka , Hiroyuki Furuichi , Takeo Shinoda , Hiroshi Shiomi
- Applicant: Mitsubishi Heavy Industries Engineering, Ltd.
- Applicant Address: JP Kanagawa
- Assignee: Mitsubishi Heavy Industries Engineering, Ltd.
- Current Assignee: Mitsubishi Heavy Industries Engineering, Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Osha Liang LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@13a9e6ee
- International Application: PCT/JP2016/050019 WO 20160104
- International Announcement: WO2016/111258 WO 20160714
- Main IPC: F25J1/02
- IPC: F25J1/02 ; F25J1/00

Abstract:
A gas liquefaction apparatus includes at least a source-gas supply line that supplies source gas; a room-temperature heat exchanger, a preliminary-cooling heat exchanger, and a liquefaction/supercooling heat exchanger that are provided in series sequentially in the source-gas supply line and that cool the source gas; a separation drum that separates the source gas containing a condensate, which has been cooled by heat exchange up to a liquefaction temperature of the source gas or below, into a gas component and a liquefied component; and a refrigerant-gas supply line that uses a gas component separated by the separation drum as refrigerant gas to supply the refrigerant gas in a direction opposite to a supply direction of the source gas, in order of the liquefaction/supercooling heat exchanger, the preliminary-cooling heat exchanger, and the room-temperature heat exchanger.
Public/Granted literature
- US20170356687A1 GAS LIQUEFACTION APPARATUS AND GAS LIQUEFACTION METHOD Public/Granted day:2017-12-14
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