Invention Grant
- Patent Title: Method for determining the concentration of an element of a heteroepitaxial layer
-
Application No.: US15783600Application Date: 2017-10-13
-
Publication No.: US10718726B2Publication Date: 2020-07-21
- Inventor: Katja Hoenes
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: G01N23/207
- IPC: G01N23/207 ; G01N23/20 ; G01N23/20008

Abstract:
In an embodiment, a method for determining the concentration of an element of a heteroepitaxial layer includes generating a reciprocal space map in Qz and Qx directions in a portion of reciprocal space describing positions of diffracted X-ray peaks of a heteroepitaxial layer and of a substrate on which the heteroepitaxial layer is positioned, determining the position of a diffracted X-ray peak of the substrate in the reciprocal space map in the Qx direction, determining the expected position of the diffracted X-ray peak of the heteroepitaxial layer in the Qx direction based on the determined position of the diffracted X-ray peak of the substrate in the Qx direction, generating a scan of the heteroepitaxial layer in a Qz direction at the expected position in the Qx direction, and determining the concentration of a constituent element of the heteroepitaxial layer based on the scan.
Public/Granted literature
- US20190113468A1 Method for Determining the Concentration of an Element of a Heteroepitaxial Layer Public/Granted day:2019-04-18
Information query