Invention Grant
- Patent Title: Attraction device, method for producing attraction device, and vacuum processing device
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Application No.: US15719947Application Date: 2017-09-29
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Publication No.: US10720858B2Publication Date: 2020-07-21
- Inventor: Ken Maehira , Kou Fuwa
- Applicant: ULVAC, INC.
- Applicant Address: JP Chigasaki-shi
- Assignee: ULVAC, INC.
- Current Assignee: ULVAC, INC.
- Current Assignee Address: JP Chigasaki-shi
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4908fcf3
- Main IPC: H02N13/00
- IPC: H02N13/00 ; H01L21/683 ; H01L21/67 ; B23Q3/15 ; H01J37/32 ; H01J37/34

Abstract:
Providing a technique for suppressing dust generation at the time of attraction and detachment of an object to be attracted, and for enabling control the attraction force of the attraction device to be uniform. The attraction device of the present invention includes a main body part having attraction electrodes within a dielectric; and an attraction part for attracting a substrate, provided on a surface of the main body part at an attraction-side. The attraction part includes a contact support part that is in contact with, and supports the substrate and a non-contact part that is not in contact with the substrate. In the attraction part, the volume resistivity of the material of the contact support part is greater than the volume resistivity of the material of the non-contact part.
Public/Granted literature
- US20180175749A1 ATTRACTION DEVICE, METHOD FOR PRODUCING ATTRACTION DEVICE, AND VACUUM PROCESSING DEVICE Public/Granted day:2018-06-21
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