Invention Grant
- Patent Title: Systems and methods for exposure control
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Application No.: US16454152Application Date: 2019-06-27
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Publication No.: US10721409B2Publication Date: 2020-07-21
- Inventor: Yanfen Zhou , Runfa Pan , Liangcheng Li , Qianfeng Huang , Erli Lu , Mingzhu Chen
- Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Applicant Address: CN Hangzhou
- Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Current Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Hangzhou
- Agency: Metis IP LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5286d6b9 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@625e0990
- Main IPC: H04N5/235
- IPC: H04N5/235

Abstract:
The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.
Public/Granted literature
- US20190320107A1 SYSTEMS AND METHODS FOR EXPOSURE CONTROL Public/Granted day:2019-10-17
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