Invention Grant
- Patent Title: MEMS microphone and method for manufacturing the same
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Application No.: US15897016Application Date: 2018-02-14
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Publication No.: US10721576B2Publication Date: 2020-07-21
- Inventor: Jian Zhang , Jingxiu Ding
- Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION , SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Applicant Address: CN Shanghai CN Beijing
- Assignee: SEMICONDUCTO MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Current Assignee: SEMICONDUCTO MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
- Current Assignee Address: CN Shanghai CN Beijing
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@31e6d3f5
- Main IPC: H04R19/00
- IPC: H04R19/00 ; H04R31/00 ; B81B3/00 ; B81C1/00 ; H04R19/04 ; H04R7/18

Abstract:
A semiconductor device includes a substrate having an opening extending through the substrate and at least one support member on a sidewall of the opening, a vibration membrane on the substrate, a cover layer on the vibration membrane. The substrate, the vibration membrane, and the cover layer define a cavity. The opening exposes a lower surface portion of the vibration membrane. The at least one support member on the sidewall of the opening provides support to the vibration membrane in a deformation of the vibration membrane to prevent breakage.
Public/Granted literature
- US20180317033A1 MEMS MICROPHONE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-11-01
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