Invention Grant
- Patent Title: SiO2 containing dispersion with high salt stability
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Application No.: US15743177Application Date: 2016-06-28
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Publication No.: US10723628B2Publication Date: 2020-07-28
- Inventor: Wolfgang Lortz , Ulrich Fischer , Christian Panz , Gabriele Bergmann
- Applicant: Evonik Degussa GmbH
- Applicant Address: DE Essen
- Assignee: Evonik Operations GmbH
- Current Assignee: Evonik Operations GmbH
- Current Assignee Address: DE Essen
- Agency: Law Office of: Michael A. Sanzo, LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@563ff285
- International Application: PCT/EP2016/064966 WO 20160628
- International Announcement: WO2017/009033 WO 20170119
- Main IPC: C01B33/149
- IPC: C01B33/149 ; C01B33/141 ; C01B33/159 ; C01B33/14

Abstract:
Dispersion comprising particles of a surface-modified, hydrophilic silica, where A) the particles of the surface-modified, hydrophilic silica comprise an aluminium atom and a hydrocarbon radical, a) the aluminium atom is bonded via an oxygen atom to a silicon atom of the particle surface, b) the hydrocarbon radical comprises a silicon atom which is bonded to a carbon atom of the hydrocarbon radical, c) possess an average particle diameter d50 in the dispersion of 40-200 nm, preferably 60-150 nm, and B) the pH of the dispersion is 8 or more.
Public/Granted literature
- US20190106328A1 SiO2 Containing Dispersion With High Salt Stability Public/Granted day:2019-04-11
Information query
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