Invention Grant
- Patent Title: Method of manufacturing silicon single crystal
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Application No.: US15773323Application Date: 2016-11-01
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Publication No.: US10724150B2Publication Date: 2020-07-28
- Inventor: Kaoru Kajiwara , Ryota Suewaka , Hideki Tanaka , Takahiro Kanehara
- Applicant: SUMCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SUMCO CORPORATION
- Current Assignee: SUMCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@516de4ec
- International Application: PCT/JP2016/082376 WO 20161101
- International Announcement: WO2017/082112 WO 20170518
- Main IPC: C30B15/14
- IPC: C30B15/14 ; C30B29/06 ; C30B15/10

Abstract:
A method of manufacturing a single crystal is provided with a raw material melting step of heating a silicon raw material in a quartz crucible using a carbon heater to generate a silicon melt; and a crystal pull-up step of pulling up a single crystal from the silicon melt generated by the raw material melting step, wherein the silicon raw material is heated with the maximum surface temperature of a first part of the heater that is positioned above at least the upper end of the quartz crucible maintained below 1500° C. in the raw material melting step.
Public/Granted literature
- US20180320288A1 METHOD OF MANUFACTURING SILICON SINGLE CRYSTAL Public/Granted day:2018-11-08
Information query
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