Invention Grant
- Patent Title: Systems and methods for crack detection
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Application No.: US16271049Application Date: 2019-02-08
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Publication No.: US10724965B2Publication Date: 2020-07-28
- Inventor: Emanuel M. Sachs , Tonio Buonassisi , Sarah Wieghold , Zhe Liu
- Applicant: Massachusetts Institute of Technology
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01N21/88 ; H01L21/67

Abstract:
Embodiments related to systems and methods of crack detection in wafers (e.g., silicon wafers for photovoltaics, photovoltaic devices including silicon wafers) are disclosed. In some embodiments, an apparatus may include a light source configured to illuminate a side of a wafer and a camera directed towards a first face of the wafer. In some embodiments, a long axis of a field of view of the camera may be angled relative to a propagation direction of the light source. In some embodiments, at least a portion of the field of view of the camera is offset from the path of propagation of light emitted from the light source through the wafer. In some embodiments, at least a portion of a light beam may be oriented at a positive non-zero angle relative to the first face of the wafer, and a dimension of the light beam normal to the first face of the wafer may be larger than a thickness of the wafer.
Public/Granted literature
- US20190250108A1 SYSTEMS AND METHODS FOR CRACK DETECTION Public/Granted day:2019-08-15
Information query