Invention Grant
- Patent Title: Self-similarity analysis for defect detection on patterned industrial objects
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Application No.: US15785904Application Date: 2017-10-17
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Publication No.: US10726540B2Publication Date: 2020-07-28
- Inventor: Jing Chang Huang , Wei Sun , Jun Chi Yan , Ren Jie Yao , Jun Zhu
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Tihon Poltavets
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06K9/62 ; G01N21/88 ; G09G3/00

Abstract:
A method for object defect detection includes receiving digital data representing an image of an object with a repeated pattern. The method identifies a part of the image of the object as defined by a sample window of the digital data. The method generates one or more functions from at least the part of the image, wherein each of the one or more functions corresponds to one component of a pixel contained in the part of the image. Responsive to performing self-similarity analytics on the one or more functions, the method identifies a defect area of the object.
Public/Granted literature
- US20190114754A1 INDUSTRIAL OBJECT DEFECT DETECTION Public/Granted day:2019-04-18
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