Invention Grant
- Patent Title: Doping system, doping method and method for manufacturing silicon carbide semiconductor device
-
Application No.: US16201479Application Date: 2018-11-27
-
Publication No.: US10727060B2Publication Date: 2020-07-28
- Inventor: Kenichi Iguchi , Haruo Nakazawa
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@33daece0
- Main IPC: H01L21/04
- IPC: H01L21/04 ; B23K26/00 ; B23K26/0622 ; B23K26/06 ; B23K26/352 ; H01L29/861 ; H01L29/66 ; H01L29/16 ; H01L29/167 ; H01L29/872 ; H01L29/06 ; H01L29/45

Abstract:
A doping system includes a light source to emit an optical pulse; a light source controller connected to the light source, to control an energy density of the optical pulse; and a beam adjusting unit to irradiate the optical pulse to a surface of a doping-object made of silicon carbide on which an impurity-containing source-film containing impurity atoms is deposited. The light source controller irradiates a first optical pulse to the impurity-containing source-film so as to form a reaction-product layer in the doping-object, and irradiates a second optical pulse having an energy density higher than an energy density of the first optical pulse, so as to introduce the impurity atoms into the target through the reaction-product layer.
Public/Granted literature
- US20190228971A1 DOPING SYSTEM, DOPING METHOD AND METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE Public/Granted day:2019-07-25
Information query
IPC分类: