- Patent Title: Semiconductor devices and methods for forming semiconductor devices
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Application No.: US15881411Application Date: 2018-01-26
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Publication No.: US10727107B2Publication Date: 2020-07-28
- Inventor: Hermann Gruber , Markus Muellauer , Matthias Stecher
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5b8ec0b2
- Main IPC: H01L21/762
- IPC: H01L21/762 ; H01L23/522 ; H01L23/528

Abstract:
A semiconductor device includes a semiconductor substrate having a first region and a second region. The semiconductor device also includes an insulating structure laterally between the first region and the second region in the semiconductor substrate. The insulating structure electrically insulates the first region laterally from the second region in the semiconductor substrate. The semiconductor device further includes a connecting structure at a surface of the semiconductor substrate. The connecting structure contacts at least a sub-structure of the insulating structure and at least one of the first region and the second region. At least a sub-structure of the connecting structure has an electrical resistivity greater than 1*103 Ωm and less than 1*1012 Ωm.
Public/Granted literature
- US20180218939A1 Semiconductor Devices and Methods for Forming Semiconductor Devices Public/Granted day:2018-08-02
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