Invention Grant
- Patent Title: Method of processing a substrate
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Application No.: US15872615Application Date: 2018-01-16
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Publication No.: US10727127B2Publication Date: 2020-07-28
- Inventor: Hiroshi Morikazu , Karl Heinz Priewasser , Nao Hattori
- Applicant: DISCO Corporation
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@72398c3e
- Main IPC: H01L21/78
- IPC: H01L21/78 ; B23K26/0622 ; B23K26/38 ; B28D5/02 ; B23K26/00 ; B23K26/08 ; B23K26/53 ; B23K101/40 ; B23K103/00 ; H01L21/304 ; H01L33/00

Abstract:
A method of processing a substrate, having a first surface with at least one division line formed thereon and a second surface opposite the first surface, includes applying a pulsed laser beam to the substrate from the side of the first surface, at least in a plurality of positions along the at least one division line, so as to form a plurality of modified regions in the substrate, each modified region extending at least from the first surface towards the second surface. Each modified region is formed by melting substrate material by means of the pulsed laser beam and allowing the molten substrate material to resolidify. The method further comprises removing substrate material along the at least one division line where the plurality of modified regions has been formed.
Public/Granted literature
- US20180204771A1 METHOD OF PROCESSING A SUBSTRATE Public/Granted day:2018-07-19
Information query
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