Method of fabricating organic light-emitting diode touch display screen
Abstract:
A method of fabricating an organic light-emitting diode (OLED) touch display screen is provided and has steps of forming a thin film transistor (TFT) layer, an OLED layer, and a touch layer on a base substrate sequentially. Compared with prior art, upon fabricating a touch layer, a first insulating layer is not etched after depositing the first insulating layer and before depositing a bridging point layer. After depositing and forming a second insulating layer, the first and second insulating layers are dry-etched together using combination of two etching gases to achieve fabricating two different depths contact holes in the touch layer in a same process, which effectively reduces erosion of the OLED by a wet-etching process, simplifies a producing process, improves device-producing capacity, and simultaneously achieves a pre-protection effect on touch lines and bonding pads in a source-drain electrode layer to avoid functional failure caused by over-etching or oxidation.
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