Invention Grant
- Patent Title: Magnetic random access memory
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Application No.: US15906901Application Date: 2018-02-27
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Publication No.: US10727401B2Publication Date: 2020-07-28
- Inventor: Baohua Niu , Ji-Feng Ying
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: H01L43/10
- IPC: H01L43/10 ; G11C11/16 ; H01L43/08 ; H01L43/12 ; H01L27/22 ; H01L21/62

Abstract:
A memory cell of a magnetic random access memory includes multiple layers disposed between a first metal layer and a second metal layer. At least one of the multiple layers include one selected from the group consisting of an iridium layer, a bilayer structure of an iridium layer and an iridium oxide layer, an iridium-titanium nitride layer, a bilayer structure of an iridium layer and a tantalum layer, and a binary alloy layer of iridium and tantalum.
Public/Granted literature
- US20190148628A1 MAGNETIC RANDOM ACCESS MEMORY Public/Granted day:2019-05-16
Information query
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