Invention Grant
- Patent Title: Method for manufacturing liquid discharge head, liquid discharge head, and method for manufacturing liquid discharge head substrate
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Application No.: US16271697Application Date: 2019-02-08
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Publication No.: US10730299B2Publication Date: 2020-08-04
- Inventor: Yuji Tamaru , Yuichiro Akama , Naoko Tsujiuchi , Sayaka Seki , Yasuaki Kitayama , Yusuke Hashimoto , Takanobu Manabe
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@67e6acad
- Main IPC: B41J2/16
- IPC: B41J2/16

Abstract:
There is provided a method for manufacturing a liquid discharge head including a liquid discharge head substrate and a flow path forming member, the liquid discharge head substrate having a base, a pressure generation portion provided at a front surface of the base to generate pressure for discharging a liquid, and a supply port for supplying the liquid to the pressure generation portion, and the flow path forming member forming a flow path for feeding the liquid supplied from the supply port to the pressure generation portion. The method includes removing a sacrificial layer by etching the base from a back surface of the base, in a state in which an end covering portion of a cover layer for covering the sacrificial layer is covered with the resin layer. The method suppresses formation of a crack in the end covering portion that covers the end portion of the sacrificial layer.
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