Invention Grant
- Patent Title: Microelectromechanical displacement structure and method for controlling displacement
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Application No.: US15282870Application Date: 2016-09-30
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Publication No.: US10730740B2Publication Date: 2020-08-04
- Inventor: Luzhong Yin , Jing Zhao
- Applicant: Agiltron, Inc.
- Applicant Address: US MA Woburn
- Assignee: Agiltron, Inc.
- Current Assignee: Agiltron, Inc.
- Current Assignee Address: US MA Woburn
- Agency: McCarter & English, LLP
- Main IPC: B81B3/00
- IPC: B81B3/00 ; G02B26/04 ; G02B26/02 ; H02N2/04 ; H02N10/00

Abstract:
The present disclosure provides a displacement amplification structure and a method for controlling displacement. In one aspect, the displacement amplification structure of the present disclosure includes a first beam and a second beam substantially parallel to the first beam, an end of the first beam coupled to a fixture site, an end of the second beam coupled to a motion actuator, and a motion shutter coupled to an opposing end of the first and second beams. In response to a displacement of the motion actuator along an axis direction of the second beam, the motion shutter displaces a distance along a transversal direction substantially perpendicular to the axis direction.
Public/Granted literature
- US20170184840A1 MICROELECTROMECHANICAL DISPLACEMENT STRUCTURE AND METHOD FOR CONTROLLING DISPLACEMENT Public/Granted day:2017-06-29
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