Invention Grant
- Patent Title: Gas injector used for semiconductor equipment
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Application No.: US15871618Application Date: 2018-01-15
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Publication No.: US10731253B2Publication Date: 2020-08-04
- Inventor: Tsan-Hua Huang , Kian-Poh Wong , Chia-Ying Lin
- Applicant: HERMES-EPITEK CORPORATION
- Applicant Address: TW Taipei
- Assignee: Hermes-Epitek Corporation
- Current Assignee: Hermes-Epitek Corporation
- Current Assignee Address: TW Taipei
- Agency: Stout, Uxa & Buyan, LLP
- Agent Donald E. Stout
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5553e7e7
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/458 ; C23C16/44

Abstract:
A gas injector used for semiconductor equipment includes a housing shell, a rotating main shaft and a gas output distribution unit. The rotating main shaft is covered with the housing shell, and includes a plurality of magnetic fluid seals and a plurality of gas transmission tubes. The gas output distribution unit is coupled to a top end of the rotating main shaft, the gas output distribution unit being connected to a ceiling and a susceptor. The gas output distribution unit includes a plurality of boards spaced at intervals between the ceiling and the susceptor, thereby resulting in a plurality of gas output layers for outputting corresponding reaction gases.
Public/Granted literature
- US20180202044A1 GAS INJECTOR USED FOR SEMICONDUCTOR EQUIPMENT Public/Granted day:2018-07-19
Information query
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