Invention Grant
- Patent Title: Highly scattering metasurface phase masks for complex wavefront engineering
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Application No.: US15957541Application Date: 2018-04-19
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Publication No.: US10732437B2Publication Date: 2020-08-04
- Inventor: Mooseok Jang , Yu Horie , Atsushi Shibukawa , Andrei Faraon , Changhuei Yang
- Applicant: California Institute of Technology
- Applicant Address: US CA Pasadena
- Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
- Current Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
- Current Assignee Address: US CA Pasadena
- Agency: Steinfl + Bruno LLP
- Main IPC: G02F1/01
- IPC: G02F1/01 ; G02B5/00 ; G02B1/00 ; G02B5/02

Abstract:
Complex wavefront engineering is realized through a random metasurface phase mask backed by a phase-only spatial light modulator. The metasurface consists of an array of subwavelength nanoscatterers which give the metasurface a pre-arranged disorder. Since the transmission matrix of the disordered metasurface is known, there is no need for extensive characterization measurements which are instead required in standard disordered optical devices.
Public/Granted literature
- US20190113775A1 Highly Scattering Metasurface Phase Masks for Complex Wavefront Engineering Public/Granted day:2019-04-18
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