Aspects of the disclosed technology relate to techniques for achieving optical proximity correction cross-tile consistency. A layout design is divided into a plurality of regions. Optical proximity correction iterations are performed on each of the plurality of regions to generate a modified layout design. Based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design, a final modified layout design is generated such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design.