Invention Grant
- Patent Title: Method for searching for reliable, significant and relevant patterns
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Application No.: US14960439Application Date: 2015-12-06
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Publication No.: US10733183B2Publication Date: 2020-08-04
- Inventor: Arun Kumar Parayatham , Ravi Kumar Meduri
- Applicant: Innominds Inc.
- Main IPC: G06N7/00
- IPC: G06N7/00 ; G06F16/245 ; G06F16/2455 ; G06F16/2458

Abstract:
The software system processes extracts reliable, significant and relevant patterns. System runs through preprocessing steps. System then generates the size 1 patterns. It then checks for both reliability and refinability of the size 1 patterns. System grows the refinable patterns by increasing the attributes and its values in the pattern by one at a time to find a size 2 pattern. The system then uses the number of pattern occurrences of size 2 pattern as a basis to find the reliable patterns. System also checks for statistical significance over the size 1 patterns and once again for the refinability of the size 2 patterns. System checks for relevance of the size 1 patterns by obtaining the disjointed record complement set. Software system readjusts the pattern statistics of size 1 and removes the non-relevant super-patterns. This process is repeated from size 2 to N.
Public/Granted literature
- US20170161321A1 Method for searching for reliable, significant & relevant patterns Public/Granted day:2017-06-08
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06N | 基于特定计算模型的计算机系统 |
G06N7/00 | 基于特定数学模式的计算机系统 |