Invention Grant
- Patent Title: Wafer inspection apparatus and wafer inspection method using the same
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Application No.: US15466951Application Date: 2017-03-23
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Publication No.: US10733719B2Publication Date: 2020-08-04
- Inventor: Tae Heung Ahn , Soo Ryonng Kim , Tae Joong Kim , Jun Bum Park , Byeong Hwan Jeon , Jae Chol Joo
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@25ca206
- Main IPC: H04N5/225
- IPC: H04N5/225 ; G06T7/00 ; G01B11/27 ; G01N21/95

Abstract:
A wafer inspection apparatus includes a linear stage configured to support a chuck on which a wafer is disposed and to move the chuck along a guide rail, wherein the guide rail extends in a first direction, an image sensor module overlapping the linear stage, and a rotary stage supported by the linear stage. The rotary stage is configured to rotate the chuck in a state where a center of the wafer is aligned with the image sensor module. The image sensor module includes a light source directing light onto the wafer, and an image sensor extending in a second direction crossing the first direction.
Public/Granted literature
- US20180061041A1 WAFER INSPECTION APPARATUS AND WAFER INSPECTION METHOD USING THE SAME Public/Granted day:2018-03-01
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