Invention Grant
- Patent Title: Ion implantation amount adjustment device and method, ion implantation apparatus and determination method
-
Application No.: US16323418Application Date: 2018-03-28
-
Publication No.: US10734189B2Publication Date: 2020-08-04
- Inventor: Hao Jing , Dongwoo Kang , Yongyi Fu , Chenliang Liu , Rujian Li , Kang Luo
- Applicant: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Chengdu, Sichuan CN Beijing
- Assignee: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Chengdu, Sichuan CN Beijing
- Agency: Brooks Kushman P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2f82f08b
- International Application: PCT/CN2018/080897 WO 20180328
- International Announcement: WO2018/233337 WO 20181227
- Main IPC: H01J37/02
- IPC: H01J37/02 ; H01J37/244 ; H01J37/317 ; H01J37/05
Abstract:
The present disclosure relates to an ion implantation amount adjustment device that includes: an adjuster configured to turn on or off an ion outlet of the ion implantation apparatus; and an actuator configured to control movement of the adjuster to adjust an opening degree of the ion outlet.
Public/Granted literature
Information query
