- Patent Title: Bonding support structure (and related process) for wafer stacking
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Application No.: US16178819Application Date: 2018-11-02
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Publication No.: US10734285B2Publication Date: 2020-08-04
- Inventor: Sheng-Chan Li , Cheng-Hsien Chou , Cheng-Yuan Tsai , Chih-Hui Huang , Kuo-Ming Wu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L21/822
- IPC: H01L21/822 ; H01L23/532 ; H01L23/528 ; H01L23/522 ; H01L21/768 ; H01L23/00 ; H01L25/065

Abstract:
In some embodiments, a method for bonding semiconductor wafers is provided. The method includes forming a first integrated circuit (IC) over a central region of a first semiconductor wafer. A first ring-shaped bonding support structure is formed over a ring-shaped peripheral region of the first semiconductor wafer, where the ring-shaped peripheral region of the first semiconductor wafer encircles the central region of the first semiconductor wafer. A second semiconductor wafer is bonded to the first semiconductor wafer, such that a second IC arranged on the second semiconductor wafer is electrically coupled to the first IC.
Public/Granted literature
- US20200006145A1 BONDING SUPPORT STRUCTURE (AND RELATED PROCESS) FOR WAFER STACKING Public/Granted day:2020-01-02
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