Invention Grant
- Patent Title: Ferroelectric non-volatile memory
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Application No.: US16580175Application Date: 2019-09-24
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Publication No.: US10734408B2Publication Date: 2020-08-04
- Inventor: Yingda Dong , Yangyin Chen , Yukihiro Sakotsubo
- Applicant: SanDisk Technologies LLC
- Applicant Address: US TX Addison
- Assignee: SanDisk Technologies LLC
- Current Assignee: SanDisk Technologies LLC
- Current Assignee Address: US TX Addison
- Agency: Vierra Magen Marcus LLP
- Main IPC: H01L27/1159
- IPC: H01L27/1159 ; H01L27/11597 ; H01L27/11524 ; H01L27/11556 ; H01L27/11582 ; H01L27/11519 ; H01L27/11565 ; H01L27/1157 ; H01L27/11587

Abstract:
A non-volatile memory system is provided that includes a plurality of NAND strings of non-volatile storage elements, each non-volatile storage element including a control gate, a tunneling layer, a floating gate, and a blocking layer including a ferroelectric material. The tunneling layer is disposed between the control gate and the floating gate, and the floating gate is disposed between the tunneling layer and the blocking layer.
Public/Granted literature
- US20200020704A1 FERROELECTRIC NON-VOLATILE MEMORY Public/Granted day:2020-01-16
Information query
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