Invention Grant
- Patent Title: Substantially defect free relaxed heterogeneous semiconductor fins on bulk substrates
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Application No.: US16230427Application Date: 2018-12-21
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Publication No.: US10734518B2Publication Date: 2020-08-04
- Inventor: Veeraraghavan S. Basker , Oleg Gluschenkov , Shogo Mochizuki , Alexander Reznicek
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murhpy & Presser, P.C.
- Agent Daniel P. Morris, Esq.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/78 ; H01L29/04 ; H01L29/66

Abstract:
A semiconductor structure is provided that includes a bulk semiconductor substrate of a first semiconductor material. The structure further includes a plurality of fin pedestal structures of a second semiconductor material located on the bulk semiconductor substrate of the first semiconductor material, wherein the second semiconductor material is different from the first semiconductor material. In accordance with the present application, each fin pedestal structure includes a pair of spaced apart semiconductor fins of the second semiconductor material.
Public/Granted literature
- US20190148549A1 SUBSTANTIALLY DEFECT FREE RELAXED HETEROGENEOUS SEMICONDUCTOR FINS ON BULK SUBSTRATES Public/Granted day:2019-05-16
Information query
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