Invention Grant
- Patent Title: Resin composition, cured photoresist and display panel
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Application No.: US16033238Application Date: 2018-07-12
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Publication No.: US10738241B2Publication Date: 2020-08-11
- Inventor: Xia Zhang
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@65db4053
- Main IPC: C09K19/54
- IPC: C09K19/54 ; C08L33/08 ; C08F2/48 ; C08L33/04 ; C08F265/06

Abstract:
The present disclosure provides a resin composition, a cured photoresist and a display panel. The resin composition includes an initiator, at least one multifunctional monomer, a resin, a solvent, and an agent; wherein the multifunctional monomer comprises a monomer compound with the secondary amine group. Through the above-mentioned method, the present disclosure can realize the low-temperature curing of a photoresist, and can further reduce the phenomenon of high-temperature yellowing of the organic flat layer material during the subsequent curing process, and the high-temperature deformation of the substrate can be avoided in the application of flexible displays.
Public/Granted literature
- US20190225885A1 RESIN COMPOSITION, CURED PHOTORESIST AND DISPLAY PANEL Public/Granted day:2019-07-25
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