Invention Grant
- Patent Title: Current-induced dark layer formation for metallization in electronic devices
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Application No.: US15873970Application Date: 2018-01-18
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Publication No.: US10739879B2Publication Date: 2020-08-11
- Inventor: Helia Jalili , Francois Dary , Barbara Cox
- Applicant: H.C. STARCK INC.
- Applicant Address: US MA Newton
- Assignee: H.C. STARCK INC.
- Current Assignee: H.C. STARCK INC.
- Current Assignee Address: US MA Newton
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: G06F3/041
- IPC: G06F3/041 ; G02F1/1333 ; H01L27/15 ; H01L21/768 ; C25D11/02 ; H01L23/532 ; G02F1/1362
Abstract:
In various embodiments, bilayers are formed in electronic devices at least in part by anodization of metal-alloy base layers.
Public/Granted literature
- US20180203536A1 CURRENT-INDUCED DARK LAYER FORMATION FOR METALLIZATION IN ELECTRONIC DEVICES Public/Granted day:2018-07-19
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