Invention Grant
- Patent Title: Methods of forming nanostructures using self-assembled nucleic acids, and nanostructures thereof
-
Application No.: US15798672Application Date: 2017-10-31
-
Publication No.: US10741382B2Publication Date: 2020-08-11
- Inventor: Scott E. Sills , Gurtej S. Sandhu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/033 ; H01L29/06 ; B82Y40/00 ; H01L29/66 ; B81C1/00 ; H01L21/311 ; H01L29/02
Abstract:
A method of forming a nanostructure comprises forming a directed self-assembly of nucleic acid structures on a patterned substrate. The patterned substrate comprises multiple regions. Each of the regions on the patterned substrate is specifically tailored for adsorption of specific nucleic acid structure in the directed self-assembly.
Public/Granted literature
- US20180061635A1 METHODS OF FORMING NANOSTRUCTURES USING SELF-ASSEMBLED NUCLEIC ACIDS, AND NANOSTRUCTURES THEREOF Public/Granted day:2018-03-01
Information query
IPC分类:
