Invention Grant
- Patent Title: Pressure sensor and manufacturing method thereof
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Application No.: US16163934Application Date: 2018-10-18
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Publication No.: US10741746B2Publication Date: 2020-08-11
- Inventor: Suk Won Jung , Nam Kyu Cho
- Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
- Applicant Address: KR Seongnam-si, Gyeonggi-Do
- Assignee: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
- Current Assignee: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
- Current Assignee Address: KR Seongnam-si, Gyeonggi-Do
- Agency: Hauptman Ham, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@150956f4
- Main IPC: H01L41/08
- IPC: H01L41/08 ; H01L41/39 ; H01L29/84 ; H01L41/113 ; H01L29/06 ; H01L41/18 ; G01L9/00

Abstract:
Disclosed is a silicon nanowire pressure sensor including a lower substrate with a diaphragm recess in a lower surface thereof, an upper substrate having a first surface attached to an upper surface of the lower substrate, silicon nanowires formed on the first surface of the upper substrate, resistive portions exposed on a second surface of the upper substrate, and a diaphragm region formed by etching a center portion of the second surface of the upper substrate so as to be aligned with the resistive portions, in which the diaphragm recess is larger than the diaphragm region.
Public/Granted literature
- US20190172995A1 PRESSURE SENSOR AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-06-06
Information query
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