Invention Grant
- Patent Title: VCSEL with elliptical aperture having reduced RIN
-
Application No.: US16424262Application Date: 2019-05-28
-
Publication No.: US10742000B2Publication Date: 2020-08-11
- Inventor: Deepa Gazula , Nicolae Chitica , Marek Chacinski , Gary Landry , Jim Tatum
- Applicant: FINISAR CORPORATION
- Applicant Address: US DE Wilmington
- Assignee: II-VI Delaware Inc.
- Current Assignee: II-VI Delaware Inc.
- Current Assignee Address: US DE Wilmington
- Agency: Maschoff Brennan
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/00 ; H01S5/022 ; H01S5/14 ; H01S5/42

Abstract:
A VCSEL can include: an elliptical oxide aperture in an oxidized region that is located between an active region and an emission surface, the elliptical aperture having a short radius and a long radius with a radius ratio (short radius)/(long radius) being between 0.6 and 0.8, the VCSEL having a relative intensity noise (RIN) of less than −140 dB/Hz. The VCSEL can include an elliptical emission aperture having the same dimensions of the elliptical oxide aperture. The VCSEL can include an elliptical contact having an elliptical contact aperture therein, the elliptical contact being around the elliptical emission aperture. The elliptical contact can be C-shaped. The VCSEL can include one or more trenches lateral of the oxidized region, the one or more trenches forming an elliptical shape, wherein the oxidized region has an elliptical shape. The one or more trenches can be trapezoidal shaped trenches.
Public/Granted literature
- US20190341743A1 VCSEL WITH ELLIPTICAL APERTURE HAVING REDUCED RIN Public/Granted day:2019-11-07
Information query