Invention Grant
- Patent Title: Three-dimensional deposition device
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Application No.: US16265520Application Date: 2019-02-01
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Publication No.: US10744561B2Publication Date: 2020-08-18
- Inventor: Hitoshi Yoshimura
- Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
- Current Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@24647f27
- Main IPC: B29C67/00
- IPC: B29C67/00 ; B22F3/10 ; B22F3/16 ; B33Y10/00 ; B33Y30/00 ; B22F3/105 ; B29C64/153 ; B23P23/04

Abstract:
Provided is a three-dimensional deposition device, including: a powder supply unit which supplies a powder material; a light irradiation unit which irradiates the powder material with a light beam so that the powder material irradiated with the light beam is sintered or melted and solidified to form a formed layer; a three-dimensional deposition chamber which is sealed from an outside and accommodates the powder supply unit, the light irradiation unit, and a base unit; a gas discharge unit which discharges a gas inside the three-dimensional deposition chamber; and a gas introduction unit which introduces a predetermined gas into the three-dimensional deposition chamber. When the gas discharge unit discharges a gas inside the three-dimensional deposition chamber and the gas introduction unit introduces a predetermined gas thereinto, a predetermined gas atmosphere is formed inside the three-dimensional deposition chamber.
Public/Granted literature
- US20190160535A1 THREE-DIMENSIONAL DEPOSITION DEVICE Public/Granted day:2019-05-30
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