Invention Grant
- Patent Title: Extreme ultraviolet mask blank with multilayer absorber and method of manufacture
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Application No.: US15652499Application Date: 2017-07-18
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Publication No.: US10747102B2Publication Date: 2020-08-18
- Inventor: Vibhu Jindal
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/58 ; G03F1/52 ; G03F1/60
Abstract:
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
Public/Granted literature
- US20180031964A1 Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture Public/Granted day:2018-02-01
Information query
