Invention Grant
- Patent Title: Optical processing apparatus and substrate processing apparatus
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Application No.: US15828906Application Date: 2017-12-01
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Publication No.: US10747121B2Publication Date: 2020-08-18
- Inventor: Teruhiko Moriya , Masaru Tomono , Ryo Shimada , Makoto Hayakawa , Seiji Nagahara
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Minato-Ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-Ku
- Agency: Burr & Brown, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2275db7 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@c916b80
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/677 ; H01L21/67

Abstract:
An optical processing apparatus includes: a housing; a stage; and a light irradiation unit configured to cause a light source unit to emit light so as to form a strip-like irradiation area extending over an area wider than a width of a substrate in a right and left direction. The stage and the light irradiation unit are moved by a moving mechanism relatively to each other in a back and forth direction. Light emitted from the light irradiation unit is deviated by a light-path changing unit from a relative movement area of a substrate. When a substrate is relatively moved below the light irradiation unit without the intension of being subjected to a light irradiation process, a control unit outputs a control signal such that an irradiation area is not formed on a surface of the substrate by the light-path changing unit, while the light source unit emitting light.
Public/Granted literature
- US20180164696A1 OPTICAL PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2018-06-14
Information query
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