Invention Grant
- Patent Title: Method for manufacturing integrated circuit with aid of pattern based timing database indicating aging effect
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Application No.: US16191172Application Date: 2018-11-14
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Publication No.: US10747924B2Publication Date: 2020-08-18
- Inventor: Ravi Babu Pittu , Li Chung Hsu , Sung-Yen Yeh , Chung-Hsing Wang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: G06F30/3312
- IPC: G06F30/3312 ; H03K19/20 ; H01L21/82

Abstract:
A method for manufacturing an integrated circuit includes determining a static probability pattern of a circuit cell in a timing path of the integrated circuit; determining a timing delay of the circuit cell along the timing path according to the static probability pattern and a pattern based timing database, wherein the pattern based timing database indicates a plurality of reference delays of each timing arc of the circuit cell characterized in response to a plurality of input stress patterns respectively; and manufacturing the integrated circuit according to the timing delay of the circuit cell along the timing path.
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