Invention Grant
- Patent Title: Deflection array apparatus for multi-electron beam system
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Application No.: US16230325Application Date: 2018-12-21
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Publication No.: US10748739B2Publication Date: 2020-08-18
- Inventor: Xinrong Jiang , Christopher Sears
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01J37/12
- IPC: H01J37/12 ; H01J37/06

Abstract:
An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources. The MDA may be configured to split a primary electron beam from the electron source into a plurality of primary electron beamlets. The system may be configured to focus the plurality of primary electron beamlets at a wafer plane.
Public/Granted literature
- US20200118784A1 Deflection Array Apparatus for Multi-Electron Beam System Public/Granted day:2020-04-16
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