Invention Grant
- Patent Title: Copper paste for joining, method for manufacturing joined body, and method for manufacturing semiconductor device
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Application No.: US16096807Application Date: 2017-04-20
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Publication No.: US10748865B2Publication Date: 2020-08-18
- Inventor: Yuki Kawana , Hideo Nakako , Dai Ishikawa , Chie Sugama , Kazuhiko Kurafuchi , Yoshinori Ejiri
- Applicant: HITACHI CHEMICAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@13cfda00
- International Application: PCT/JP2017/015912 WO 20170420
- International Announcement: WO2017/188123 WO 20171102
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L29/40 ; H01L23/00 ; B32B9/04 ; B22F1/00 ; B22F7/06 ; B22F7/08

Abstract:
Provided is a copper paste for joining including copper particles, second particles including a metal element other than copper, and a dispersion medium, in which the copper particles include submicro copper particles having a volume-average particle diameter of 0.12 μm or more and 0.8 μm or less and micro copper particles having a volume-average particle diameter of 2 μm or more and 50 μm or less, a sum of a content of the submicro copper particles and a content of the micro copper particles is 80% by mass or more of a sum of masses of the copper particles and the second particles, the content of the submicro copper particles is 30% by mass or more and 90% by mass or less of a sum of a mass of the submicro copper particles and a mass of the micro copper particles, and a content of the second particles is 0.01% by mass or more and 10% by mass or less of the sum of the masses of the copper particles and the second particles.
Public/Granted literature
Information query
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