Invention Grant
- Patent Title: Vertical memory devices
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Application No.: US16235122Application Date: 2018-12-28
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Publication No.: US10748924B2Publication Date: 2020-08-18
- Inventor: Jun Hyoung Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2e3b5d08
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11573 ; H01L21/768 ; H01L23/522 ; H01L27/11565

Abstract:
A vertical memory device includes first gate electrodes spaced apart from each other under a substrate in a first direction substantially perpendicular to a lower surface of the substrate, the first gate electrodes being arranged to have a staircase shape including steps of which extension lengths in a second direction substantially parallel to the lower surface of the substrate gradually increase from an uppermost level toward a lowermost level, second gate electrodes spaced apart from each other under the first gate electrodes in the first direction, the second gate electrodes being arranged to have a staircase shape including steps of which extension lengths in the second direction gradually decrease from an uppermost level toward a lowermost level and a channel extending through the first and second gate electrodes in the first direction.
Public/Granted literature
- US20190333932A1 VERTICAL MEMORY DEVICES Public/Granted day:2019-10-31
Information query
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