Invention Grant
- Patent Title: Trench power transistor and method of producing the same
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Application No.: US16567075Application Date: 2019-09-11
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Publication No.: US10749006B2Publication Date: 2020-08-18
- Inventor: Po-Hsien Li , Jen-Hao Yeh , Hsin-Yen Chiu
- Applicant: Leadpower-semi CO., LTD.
- Applicant Address: TW Zhubei
- Assignee: LEADPOWER-SEMI CO., LTD.
- Current Assignee: LEADPOWER-SEMI CO., LTD.
- Current Assignee Address: TW Zhubei
- Agency: Allen, Dyer, Doppelt + Gilchrist, PA
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@25573cc1
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/417 ; H01L21/02 ; H01L29/40 ; H01L29/10 ; H01L29/66 ; H01L21/765 ; H01L21/3213 ; H01L21/311 ; H01L21/265 ; H01L21/285 ; H01L21/8234

Abstract:
A trench power transistor includes a semiconductor body having opposite first and second surfaces, and including at least one active region. Such region includes a trench electrode structure, a well, and a source. The trench electrode structure has an electrode trench recessed from the first surface, and includes first, second, and third insulating layers sequentially disposed over bottom and surrounding walls of the electrode trench, a shield electrode enclosed by the third insulating layer, a fourth insulating layer disposed on the first, second, and third insulating layers, and a gate electrode surrounded by the fourth insulating layer. The second insulating layer made of a nitride material and the fourth insulating layer are different in material. A production method of the transistor is also disclosed.
Public/Granted literature
- US20200227526A1 TRENCH POWER TRANSISTOR AND METHOD OF PRODUCING THE SAME Public/Granted day:2020-07-16
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