Invention Grant
- Patent Title: Nail polish curing device with a light absorbing chamber
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Application No.: US16022646Application Date: 2018-06-28
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Publication No.: US10750837B2Publication Date: 2020-08-25
- Inventor: Kuo Chang Cheng
- Applicant: Kuo Chang Cheng
- Applicant Address: TW Taoyuan
- Assignee: Kuo Chang Cheng
- Current Assignee: Kuo Chang Cheng
- Current Assignee Address: TW Taoyuan
- Agency: Idea Intellectual Limited
- Agent Margaret A. Burke; Sam T. Yip
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2ad17c82
- Main IPC: G21K5/00
- IPC: G21K5/00 ; A45D29/00 ; B01J19/12

Abstract:
A nail polish curing device with a light absorbing chamber is provided, including: a lower case, an upper case, a control module and a bottom plate. The lower case includes an enclosed wall and an opening on a side of the wall. A chamber is formed by the opening and the wall. The upper case is detachably mounted on the lower case. An upper opening and a recess that serves as a hidden handle are provided on the upper case. The control module is disposed on the upper case and is configured to activate UV light emitting diode module. Herein, a light absorbing layer is provided on the bottom plate and on each surface of the lower case in the chamber. The light absorbing layers are configured to completely absorb UV light emitted by the UV light emitting diode.
Public/Granted literature
- US20190320775A1 NAIL POLISH CURING DEVICE WITH A LIGHT ABSORBING CHAMBER Public/Granted day:2019-10-24
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