Invention Grant
- Patent Title: Imprint apparatus, imprint method, and method of manufacturing article
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Application No.: US15546857Application Date: 2016-03-07
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Publication No.: US10751930B2Publication Date: 2020-08-25
- Inventor: Tsutomu Terao
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2c6b007b
- International Application: PCT/JP2016/001218 WO 20160307
- International Announcement: WO2016/166929 WO 20161020
- Main IPC: B29C59/00
- IPC: B29C59/00 ; G03F7/00 ; B29C59/02 ; B29C37/00

Abstract:
The present invention an imprint apparatus which performs an imprint process of forming a pattern in an imprint material on a substrate using a mold, the apparatus including an image capturing unit configured to obtain an image by capturing the substrate, and a processing unit configured to perform detection processing of detecting a foreign particle present between the mold and the substrate, wherein the processing unit performs the detection processing by comparing, with a reference image, an image obtained by the image capturing unit in a state in which the mold and the imprint material on the substrate are in contact with each other, and when the image includes a region outside the substrate, the region outside the substrate is excluded from a target of the detection processing.
Public/Granted literature
- US20180022015A1 IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE Public/Granted day:2018-01-25
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