Invention Grant
- Patent Title: Photocurable resin composition and method of forming patterns using the same
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Application No.: US15312883Application Date: 2016-10-05
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Publication No.: US10752718B2Publication Date: 2020-08-25
- Inventor: Hyung-Jong Lee , Nam Seob Baek , Jonghwi Lee , Yun Jung Seo , Hyun Jin Yoo
- Applicant: CHEM OPTICS INC.
- Applicant Address: KR Daejeon
- Assignee: CHEM OPTICS INC.
- Current Assignee: CHEM OPTICS INC.
- Current Assignee Address: KR Daejeon
- Agency: McCoy Russell LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@779c1006
- International Application: PCT/KR2016/011109 WO 20161005
- International Announcement: WO2017/069431 WO 20170427
- Main IPC: C08F222/18
- IPC: C08F222/18 ; C08F220/22 ; C08F236/16 ; C08F2/48 ; G03F7/027 ; G03F7/075 ; G03F7/004 ; C09D135/02 ; G03F7/00 ; G03F7/031 ; G03F7/16 ; G03F7/20
Abstract:
The present invention relates to a photocurable resin composition usable in a nanoimprint process which is capable of overcoming low productivity of conventional semiconductor processes for optical devices and electronic devices, and a method of forming patterns using the same. Specifically, the present invention relates to a photocurable resin composition including a specific perfluorinated acrylic compound for improving release property between a nanoimprint mold and the photocurable resin composition, and a method of forming patterns using the same.
Public/Granted literature
- US20180215850A1 PHOTOCURABLE RESIN COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME Public/Granted day:2018-08-02
Information query
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