Invention Grant
- Patent Title: Substrate processing apparatus and substrate processing method
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Application No.: US15785686Application Date: 2017-10-17
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Publication No.: US10752993B2Publication Date: 2020-08-25
- Inventor: Wook Sang Jang , Sang Jun Park , Ho Young Lee
- Applicant: WONIK IPS CO., LTD.
- Applicant Address: KR Pyetongtaek-si, Gyeonggi-do
- Assignee: WONIK IPS CO., LTD.
- Current Assignee: WONIK IPS CO., LTD.
- Current Assignee Address: KR Pyetongtaek-si, Gyeonggi-do
- Agency: William Park & Associates Ltd.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@69965f36
- Main IPC: H01L21/687
- IPC: H01L21/687 ; C23C16/458 ; H01L21/677 ; H01L21/02
Abstract:
Provided is a substrate processing apparatus and substrate processing method for depositing a thin film on a substrate. The substrate processing apparatus may include a chamber, a susceptor rotatably mounted in the chamber, at least one satellite mounted on the susceptor, configured to place a substrate thereon, and capable of being floated and rotating due to pressure of a gas supplied through the susceptor, to rotate the substrate, and of revolving due to rotation of the susceptor, and a cart lifting module including a cart mounted on the susceptor around the satellite and supporting an edge of the substrate to take over the substrate and place the substrate on the satellite, and a cart lifting device capable of lifting and lowering the cart.
Public/Granted literature
- US20180105934A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Public/Granted day:2018-04-19
Information query
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