Invention Grant
- Patent Title: Process for indium or indium alloy deposition and article
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Application No.: US15766016Application Date: 2016-10-04
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Publication No.: US10753007B2Publication Date: 2020-08-25
- Inventor: Grigory Vazhenin , Jan Sperling , Stefan Pieper , Mauro Castellani , Andreas Kirbs , Dirk Rohde
- Applicant: Atotech Deutschland GmbH
- Applicant Address: DE Berlin
- Assignee: Atotech Deutschland GmbH
- Current Assignee: Atotech Deutschland GmbH
- Current Assignee Address: DE Berlin
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7413542d
- International Application: PCT/EP2016/073631 WO 20161004
- International Announcement: WO2017/060216 WO 20170413
- Main IPC: C25D5/48
- IPC: C25D5/48 ; C25D5/12 ; C25D5/40 ; C25D7/00 ; C25F5/00 ; C23C18/16 ; C23C28/02 ; C25D5/10 ; C25D3/56

Abstract:
The present invention deals with a process for deposition of indium or indium alloys and an article obtained by the process, wherein the process includes the steps i. providing a substrate having at least one metal or metal alloy surface; ii. depositing a first indium or indium alloy layer on at least one portion of said surface whereby a composed phase layer is formed of a part of the metal or metal alloy surface and a part of the first indium or indium alloy layer; iii. removing partially or wholly the part of the first indium or indium alloy layer which has not been formed into the composed phase layer; iv. depositing a second indium or indium alloy layer on the at least one portion of the surface obtained in step iii.
Public/Granted literature
- US20180298511A1 PROCESS FOR INDIUM OR INDIUM ALLOY DEPOSITION AND ARTICLE Public/Granted day:2018-10-18
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